Wet Processing Stations and Cleaning Benches

Wet Processing & Cleaning Benches

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Process Control, Safety, and Consistency

Polypropylene

Economical plastic with broad chemical compatibility
Ideal for wet processing station panels
Loses some chemical resistance at high temperatures
Suitable for HF and KOH processes

Quartz

The preferred material for ultra-pure applications
Provides greater uniformity in heat transfer than plastic baths—ideal for very tight temperature control
Suitable for most chemicals (but not HF acid)
Hard surfaces won’t scuff, stain, or absorb impurities

PVDF (polyvinyldilene fluoride)

Broader range of chemical resistance than polypropylene
Suitable for high process temperatures
Ideal for HF and BOE processes at high temperatures

PTFE (Teflon®)

Resistant to an extremely wide range of chemicals
Perfect for KOH and HF acid (which etch quartz)
Softer than quartz, so care must be taken to avoid scuffing, staining

Terra’s comprehensive range of constant-temperature baths, etching baths, dump risers, and other processing equipment is ideally suited for the high-purity requirements of the semiconductor industry. Microprocessor controls ensure the integrity of your operations.

The chart below indicates the baths best suited for common semiconductor operations. Once you select the equipment that meets your requirements, a Terra process engineer will help configure a turnkey solution.

Product Application Chart

Commercial or Generic Name	Process	Chemical Composition	Concentration	Typical Temperature	Recommended Product
Aqua Regia	Gold Etchant	Hydrochloric Acid (HCl) Nitric Acid (HNO₃)	75% 25%	90°	C Series
Buffered Oxide Etch (BOE)	Etch SiO₂	Ammonium Fluoride (NH₄F) Aqueous Hydrofluoric Acid (HF) Aqueous	40%	15-40°C Ambient	A Series RCe Series
CP8	Etch	Nitric Acid (HNO₃) Hydrofluoric Acid (HF)		Ambient	A Series
Etch (Indium) Molybdenum Platinum Nichrome	Etch	Hydrochloric Acid (HCl) Aqueous Nitric Acid (HNO₃)	37-38% 70-71%		QA Series
Metal Etch	Etch A, AlSi Al Si Cu	Phosphoric Acid (H₃PO₄) Acetic Acid (CH₃COOH) Nitric Acid (HNO₃)	85-87%	30-60°C	QA Series
Nitride Etch	Etch	Phosphoric Acid (H₃PO₄) DI Water (H₂0)	85-87% 15-13%	150-185°C	Nb Series
Organic Stripper	Resist Removal	PRS-1000 S-43 Lozolin No Phenol-922	Full strength	Room Temperature 120°C	Nb Series
Oxide Resist Strip	SiO₂ Resist Stripping	Sulfuric Acid (H₂SO₄) Ammonium Persulfate (NH₄S₂O₂)	95-96%		QA Series
Phenolic Stripper	Resist Removal	J100 Bermar 712D R-10		95-100°C	C Series
Resist Series (Metalized)	Resist Removal	Chromic Sulfuric Acid (CrO₃+H₂SO₄)			A Series
R.C.A. Clean	Pre-Diffusion Cleans Quartzware	Step 1: Water Hydrogen Peroxide (H₂O₂) Ammonium Fuoride (NH₄CH) Step 2: DI Water (H₂O) Hydrogen Peroxide (H₂O₂) Hydrochloric Acid (HCL)	40%	75-85°C	Qa Series
Silicon Etch	Etch	Acetic Acid (CH₃COOH) Nitric Acid (HNO₃) HydroFuoric Acid (HF)		Ambient	A Series
Sirtl Etch	Etch	Chromium Trioxide (CrO₃) DI Water (H₂0) Hydrofluoric Acid (HF)		Ambient	A Series
Slope Etch	Etch	Phosphoric Acid (H₃PO₄) Acetic Acid (CH₃COOH) Nitric Acid (HNO₃)		55°C	Qa Series
Standard Resist Strip (do not use w/aluminum)	SiO2 Resist Strip	Sulfuric Acid (H₂SO₄) Hydrogen Peroxide (H₂O₂)	95-96%	110-140°C	Qa Series
2:1 Etch	Etch	DI Water (H₂O) Hydrofuoric Acid (HF)		Ambient	A Series
Wafer Rinsing	Rinsing	DI Water (H₂O)	100%	Ambient	DR-Series

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Wet Stations Gallery

Terra's Wet Processing and Cleaning Stations provide economical solutions for semiconductor acid etching, wafer processing and other wet chemical processes. These wafer fabrication cleaning stations are available in integrated and modular configurations.

Integrated Wet Cleaning Stations feature one complete turnkey system with built-in Class 100 HEPA filtration, made of acid-resistant polypropylene or solvent-friendly stainless steel. Modular Wet Cleaning Stations offer more flexibility, with the wet station and overhead laminar flow hood as separate units. Terra's Solvent Spray Booth with full stainless steel construction features fire-resistant components and safety systems, ideal for applications with flammable chemical solvents.

Shop our wide selection of pre-engineered wet processing stations, or reach out to a product specialist to discuss custom designs. Our team will work with you to develop an effective, economical solution.

Solvent Spray Booth; 240VAC/50Hz, 48"W x 30"D x 84.548"H (1530-41-220)
$26,395

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Available ISO Ratings: ISO 6, ISO 7, ISO 8

Features and Benefits

Polypropylene Wet Cleaning Station

Standard models include a reinforced cabinet of the specified size and material, a sliding access shield, and a fluorescent illuminator; modular desk allows positioning of tanks and sinks to suit your process.

N2 and DI Water Spray Guns

Handy spray guns provide a ready sources of nitrogen or deionized water installed in locations to suit your process requirements (shown: DI water spray gun installed on cleaning station).

Fully Customizable Work Stations

Use Terra's QuickQuote form to specify your processing requirements; Modular wet station designs adapt to specific processing requirements (shown: custom Manual Wafer Processing Bench).

Modular Cleaning Station with Laminar Flow Bench

Terra's modular wet cleaning stations integrate with the Vertical Laminar Flow Hood (shown: No. 2000-16) to provide a HEPA-filtered work environment and safe fume ventilation.

Modular Deck Configurations

Modular designs allow tanks and bath locations to suit your process. Shown: wafer processing bench with programmable quartz baths and rinsers (controls mounted above or below desk to suit protocol).

Chemical Delivery and Treatment Systems

Many chemical delivery and treatment systems available. The Chemical Delivery System shown automates chemical collection, storage and delivery in wafer etching, silicon chip plating, cleaning, and circuit board or solar system component processing.

Solvent Spray Booth with Foot-Operated Dispensing

This Solvent Spray Booth allows footpedal activation of solvent cleaning fluid; includes explosion-proof lighting, exhaust duct, sprinkers and split sink with dual collection reservoirs.

Sinks for Every Chemical Process

Many sink sizes and materials, including polypropylene (shown), PVDF and stainless steel, offer broad chemical resistance and easy cleaning; carboys collect run-off for easy disposal.

Automated andl Semi-Automated Wet Processing Benches

Specify desired processing automation level for acid-resistant polypropylene or solvent-resistant stainless steel stations. Shown: stainless steel wafer bench includes CO2 cylinder for fire suppression.

Adjustable Transparent Sash

The PVC sliding shield protects workers from contact with chemical fumes. Variable positioning helps control laminar air speeds.

Bottom Storage

Spacious storage area under the work surface holds reserve chemicals or carboys. Access doors easily slide open or closed.

Wet Stations

Modular Wet Processing Stations
Wet Cleaning Station
Complete Line of Tanks, Baths, Risers
Different N2 Generator Options to Meet Your Needs
Modular Cleaning Stations

Walkthrough of a custom Modular Wet Station Modular Wet Processing Stations Modular Wet Stations can be customized with any number of baths or tanks, as well as automation systems, to best fit your workflow.

Incorporates all processing components into one self-contained system with power switch and indicating light, light switch, static pressure | 7018-00 displayed Wet Cleaning Station Incorporates all processing components into one self-contained system with power switch and indicating light, light switch, static pressure.

Manual and programmable tanks, baths and rinsers meet critical process requirements (shown: quartz baths) | 7018-28 displayed Complete Line of Tanks, Baths, Risers Manual and programmable tanks, baths and rinsers meet critical cleaning and processing requirements including silicon nitride etching, filtered etching and solvent cleaning (shown: ultra-pure programmable quartz baths)

Different size membrane Nitrogen generator options are available to meet your N2 gas supply needs Different N2 Generator Options to Meet Your Needs Choose among 3 different sizes of portable nitrogen generator designs to meet your N2 requirements. Suitable for both industrial and commercial applications.

Modular cleaning stations, in polypropylene (shown) or stainless steel, integrate with Vertical Laminar Flow Stations for HEPA filtration | 2000-16 displayed Modular Cleaning Stations Modular cleaning stations, in polypropylene (shown) or stainless steel, integrate with Vertical Laminar Flow Stations that provide a flow of HEPA-filtered air to meet clean standards.

Technical Resources

All Resources 1

Tech Resource 1

tech resource [pdf]

Chemical Compatibility Charts

A general guide describing the effects of different chemicals on various materials. Included here are metals, plastics and rubber/synthetics.

Commercial or Generic Name

Process

Chemical Composition

Concentration

Typical Temperature